Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses

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As semiconductor manufacturers implement copper conductors in advanced interconnect schemes, research and development efforts shift toward the selection of an insulator that can take maximum advantage of the lower power and faster signal propagation allowed by copper interconnects. One of the main challenges to integrating a low-dielectric constant (low-kappa) insulator as a replacement for silico...

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As semiconductor manufacturers implement copper conductors in advanced interconnect schemes, research and development efforts shift toward the selection of an insulator that can take maximum advantage of the lower power and faster signal propagation allowed by copper interconnects. One of the main challenges to integrating a low-dielectric constant (low-kappa) insulator as a replacement for silico...

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  • Formats: pdf
  • ISBN: 9781461511656
  • Publication Date: 27 Nov 2013
  • Publisher: Springer US
  • Product language: English
  • Drm Setting: DRM