Low Pressure Plasmas and Microstructuring Technology

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Over the last forty years, plasma supported processes have attracted ever - creasing interest, and now, all modern semiconductor devices undergo at least one plasma-involved processing step, starting from surface cleaning via coating to etching. In total, the range of the treated substrates covers some orders of magnitude: Trenches and linewidths of commercially available devices have - ready pass...
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Over the last forty years, plasma supported processes have attracted ever - creasing interest, and now, all modern semiconductor devices undergo at least one plasma-involved processing step, starting from surface cleaning via coating to etching. In total, the range of the treated substrates covers some orders of magnitude: Trenches and linewidths of commercially available devices have - ready pass...
Read more
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  • Formats: pdf
  • ISBN: 9783540858492
  • Publication Date: 9 Apr 2009
  • Publisher: Springer Berlin Heidelberg
  • Product language: English
  • Drm Setting: DRM